Publications

Methods of forming alternative material fins with reduced defect density for a FinFET semiconductor device

Abstract

H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, eg a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor

Date
2015
Authors
Y Qi, AP Jacob, S Liang
Inventors
Yi Qi, Ajey Poovannummoottil Jacob, Shurong Liang
Patent_office
US
Patent_number
9123627
Application_number
14267010