Publications
Methods of forming alternative material fins with reduced defect density for a FinFET semiconductor device
Abstract
H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, eg a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- Date
- 2015
- Authors
- Y Qi, AP Jacob, S Liang
- Inventors
- Yi Qi, Ajey Poovannummoottil Jacob, Shurong Liang
- Patent_office
- US
- Patent_number
- 9123627
- Application_number
- 14267010