Publications

Methods of forming epitaxial semiconductor material on source/drain regions of a finfet semiconductor device and the resulting devices

Abstract

METHODS OF FORMING EPITAXIAL SEMCONDUCTORMATERAL ON SOURCEADRAN REGIONS OF A FINFET SEMCONDUCTOR DEVICE AND THE RESULTING DEVICES

Date
2015
Authors
JA Fronheiser, BV Krishnan, MK Akarvardar, S Bentley, AP Jacob, J Liu
Inventors
Jody A Fronheiser, Bharat V Krishnan, Murat Kerem Akarvardar, Steven Bentley, Ajey Poovannummoottil Jacob, Jinping Liu
Patent_office
US
Application_number
14164934