Abstract

A low-temperature electrical characterization of ultrathin oxide MOS capacitors with p+ poly-Si 1− x Ge x and poly-Si gate is performed. The investigated structures are suitable for future nano-scaled high speed MOSFETs. The aim of this study is to compare the low-temperature performance of poly-Si 1− x Ge x and poly-Si gate MOS structures in the nanoscale channel length regime. Apart from the significant change in the flat band voltage, the result shows that all the poly-Si and poly-Si 1− x Ge x gated MOS structures exhibit two centres of polarity change (zero-temperature coefficients) in capacitance. The second polarity change leads to an exclusive phenomenon in these structures. The low-temperature capacitance is found to be less than high-temperature capacitance at strong accumulation and this is in contrast to what has been observed so far in metal-gated capacitors. It is also observed that the temperature …

Date

2002

Authors

AP Jacob, T Myrberg, O Nur, Magnus Willander, P Lundgren, E Ö Sveinbjörnsson, LL Ye, A Thölen, M Caymax

Journal

Semiconductor science and technology

Volume

17

Issue

9

Pages

942

Publisher

IOP Publishing